Equipment Introduction: This system is designed to meet the strict requirements for ultrapure water (resistivity ≥ 18.2 MΩ·cm) in the electronic industry, such as in chip manufacturing and semiconductor packaging. It adopts a combination of “pre-treatment + reverse osmosis + EDI” processes, integrating intelligent water quality monitoring and process control technologies to ensure the stable production of ultrapure water.
The main applications of ultra-pure water equipment are as follows:

• Semiconductor industry: for 6-12 inch wafer cutting, cleaning, regeneration, packaging and testing water, semiconductor equipment cleaning, and cleaning of electronic-grade dust-free cloths and dust-free suits.
• Solar photovoltaic industry: for cleaning of monocrystalline silicon and polycrystalline silicon wafers, solar cells, quartz crucibles, polycrystalline silicon boats, photovoltaic glass, and high-purity silicon powder.
• Cleaning water for LCD, LED, OLED production, optical camera cleaning, optical material cleaning, and conductive glass cleaning.
• Ultra-pure water for cleaning in the production of semiconductor integrated circuit boards and circuit boards.
• Water for the production of lithium battery materials (lithium iron phosphate, ternary materials, lithium battery separators), storage batteries, and zinc-manganese batteries.
• Pure water for electronic-grade ultra-pure chemical reagents, nano-scale electronic ceramic materials, advanced magnetic materials, and new aviation materials production.
• Water for the smelting of non-ferrous metals and precious metals, new aviation materials production, capacitor material etching and formation processes, vacuum coating, and high-purity ink, etc.
• Cooling water for AI computing power and computer data centers.

Primary RO + EDI + Polishing Mixed Bed: Product water resistivity ≥ 18 MΩ·cm (25℃), and other indicators comply with the electronic-grade ultra-pure water standards. Source water → Source water tank → Booster pump → Sand filter → Carbon filter → Softener/Scale inhibitor → Security filter → High-pressure pump → Primary reverse osmosis → Primary water tank → Booster pump → Fine filter → EDI (Electrodeionization) device → Ultra-pure water tank (nitrogen protection is recommended) → Delivery pump → Polishing mixed bed → UV/TOC → Fine filter → Water usage point → Return water (pipeline circulation and no dead water are recommended)